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Application Note 31021. Provides additional information about layer thickness and the distribution of materials within the layer.
2013-02-12T11:11:46.392-05:00
Characterisation of high-k dielectric materials on silicon using Angle Resolved XPS
2008-05-16T19:23:26-04:00
2008-05-16T16:51:39-04:00
2008-05-16T19:23:26-04:00
2013-02-12T11:11:45.468-05:00
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